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1st International Conference on ALD Applications & 2nd China ALD conference

Prof Shi-Jin Ding, Prof Yongfeng Mei

  1. Nano Express

    Atom-to-atom interactions for atomic layer deposition of trimethylaluminum on Ga-rich GaAs(001)-4 × 6 and As-rich GaAs(001)-2 × 4 surfaces: a synchrotron radiation photoemission study

    High-resolution synchrotron radiation photoemission was employed to study the effects of atomic-layer-deposited trimethylaluminum (TMA) and water on Ga-rich GaAs(001)-4 × 6 and As-rich GaAs(001)-2 × 4 surfaces...

    Tun-Wen Pi, Hsiao-Yu Lin, Ya-Ting Liu, Tsung-Da Lin, Gunther K Wertheim, Jueinai Kwo and Minghwei Hong

    Nanoscale Research Letters 2013 8:169

    Published on: 12 April 2013

  2. Nano Express

    Passivation mechanism of thermal atomic layer-deposited Al2O3 films on silicon at different annealing temperatures

    Thermal atomic layer-deposited (ALD) aluminum oxide (Al2O3) acquires high negative fixed charge density (Qf) and sufficiently low interface trap density after annealing, which enables excellent surface passivatio...

    Yan Zhao, Chunlan Zhou, Xiang Zhang, Peng Zhang, Yanan Dou, Wenjing Wang, Xingzhong Cao, Baoyi Wang, Yehua Tang and Su Zhou

    Nanoscale Research Letters 2013 8:114

    Published on: 2 March 2013

  3. Nano Express

    Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition

    High-quality Ti-doped ZnO films were grown on Si, thermally grown SiO2, and quartz substrates by atomic layer deposition (ALD) at 200°C with various Ti doping concentrations. Titanium isopropoxide, diethyl zinc, ...

    Zhi-Yuan Ye, Hong-Liang Lu, Yang Geng, Yu-Zhu Gu, Zhang-Yi Xie, Yuan Zhang, Qing-Qing Sun, Shi-Jin Ding and David Wei Zhang

    Nanoscale Research Letters 2013 8:108

    Published on: 27 February 2013

  4. Nano Express

    Optical and microstructural properties of ZnO/TiO2 nanolaminates prepared by atomic layer deposition

    ZnO/TiO2 nanolaminates were grown on Si (100) and quartz substrates by atomic layer deposition at 200°C using diethylzinc, titanium isopropoxide, and deionized water as precursors. All prepared multilayers are no...

    Yu-Zhu Gu, Hong-Liang Lu, Yang Geng, Zhi-Yuan Ye, Yuan Zhang, Qing-Qing Sun, Shi-Jin Ding and David Wei Zhang

    Nanoscale Research Letters 2013 8:107

    Published on: 27 February 2013

  5. Nano Express

    Blue light emission from the heterostructured ZnO/InGaN/GaN

    ZnO/InGaN/GaN heterostructured light-emitting diodes (LEDs) were fabricated by molecular beam epitaxy and atomic layer deposition. InGaN films consisted of an Mg-doped InGaN layer, an undoped InGaN layer, and ...

    Ti Wang, Hao Wu, Zheng Wang, Chao Chen and Chang Liu

    Nanoscale Research Letters 2013 8:99

    Published on: 22 February 2013

  6. Nano Express

    Effect of concurrent joule heat and charge trapping on RESET for NbAlO fabricated by atomic layer deposition

    The RESET process of NbAlO-based resistive switching memory devices fabricated by atomic layer deposition is investigated at low temperatures from 80 to 200 K. We observed that the conduction mechanism of high...

    Peng Zhou, Li Ye, Qing Qing Sun, Peng Fei Wang, An Quan Jiang, Shi Jin Ding and David Wei Zhang

    Nanoscale Research Letters 2013 8:91

    Published on: 19 February 2013

  7. Nano Express

    High-performance bilayer flexible resistive random access memory based on low-temperature thermal atomic layer deposition

    We demonstrated a flexible resistive random access memory device through a low-temperature atomic layer deposition process. The device is composed of an HfO2/Al2O3-based functional stack on an indium tin oxide-co...

    Run-Chen Fang, Qing-Qing Sun, Peng Zhou, Wen Yang, Peng-Fei Wang and David Wei Zhang

    Nanoscale Research Letters 2013 8:92

    Published on: 19 February 2013

  8. Nano Express

    Performance improvement of phase-change memory cell using AlSb3Te and atomic layer deposition TiO2 buffer layer

    A phase change memory (PCM) cell with atomic layer deposition titanium dioxide bottom heating layer is investigated. The crystalline titanium dioxide heating layer promotes the temperature rise in the AlSb3Te lay...

    Sannian Song, Zhitang Song, Cheng Peng, Lina Gao, Yifeng Gu, Zhonghua Zhang, Yegang Lv, Dongning Yao, Liangcai Wu and Bo Liu

    Nanoscale Research Letters 2013 8:77

    Published on: 15 February 2013

  9. Nano Express

    Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applications

    Pt nanodots have been grown on Al2O3 film via atomic layer deposition (ALD) using (MeCp)Pt(Me)3 and O2 precursors. Influence of the substrate temperature, pulse time of (MeCp)Pt(Me)3, and deposition cycles on ALD...

    Shi-Jin Ding, Hong-Bing Chen, Xing-Mei Cui, Sun Chen, Qing-Qing Sun, Peng Zhou, Hong-Liang Lu, David Wei Zhang and Chen Shen

    Nanoscale Research Letters 2013 8:80

    Published on: 15 February 2013