Yuji Kuwahara, Prof Yukio Takahashi
Citation: Nanoscale Research Letters 2014 9:232
Yuji Kuwahara, Prof Yukio Takahashi
Citation: Nanoscale Research Letters 2014 9:232
Absolute flatness of three silicon plane mirrors have been measured by a three-intersection method based on the three-flat method using a near-infrared interferometer. The interferometer was constructed using ...
Citation: Nanoscale Research Letters 2013 8:275
In this work, we focused on the label-free detection of simple protein binding using near-infrared light-responsive plasmonic nanoshell arrays with a controlled interparticle distance. The nanoshell arrays wer...
Citation: Nanoscale Research Letters 2013 8:274
Ultraprecise optical elements are applied in advanced optical apparatus. Elastic emission machining (EEM) is one of the ultraprecision machining methods used to fabricate shapes with 0.1-nm accuracy. In this s...
Citation: Nanoscale Research Letters 2013 8:237
We have investigated the initial stage of hydrolysis process of Ga-terminated GaN surfaces by using first-principles theoretical calculations. We found that the activation barrier of H2O dissociation at the kinke...
Citation: Nanoscale Research Letters 2013 8:232
Ultraprecise aspheric mirrors that offer nanofocusing and high coherence are indispensable for developing third-generation synchrotron radiation and X-ray free-electron laser sources. In industry, the extreme ...
Citation: Nanoscale Research Letters 2013 8:231
We investigate the effects of coupling between a molecular exciton, which consists of an electron and a hole in a molecule, and a surface plasmon (exciton-plasmon coupling) on the electron transitions of the m...
Citation: Nanoscale Research Letters 2013 8:204
First-principles calculations were performed to investigate the effect of Pd concentration and oxygen vacancies on the stability of Pd at LaFeO3 surfaces. We found a much stronger tendency of Pd to segregate by t...
Citation: Nanoscale Research Letters 2013 8:203
When capacitively coupled plasma (CCP) is used to generate large-area plasma, the standing wave effect becomes significant, which results in the hindering of the uniform plasma process such as in a plasma etch...
Citation: Nanoscale Research Letters 2013 8:202
SiOxNy films with a low nitrogen concentration (< 4%) have been prepared on Si substrates at 400°C by atmospheric-pressure plasma oxidation-nitridation process using O2 and N2 as gaseous precursors diluted in He....
Citation: Nanoscale Research Letters 2013 8:201
An essentially exact ground-state calculation algorithm for few-electron systems based on superposition of nonorthogonal Slater determinants (SDs) is described, and its convergence properties to ground states ...
Citation: Nanoscale Research Letters 2013 8:200
First-principles study on the electronic structure and transport property of the boron nitride sheet (BNC) structure, in which a triangular graphene flake surrounded by a hexagonal boron nitride sheet, is impl...
Citation: Nanoscale Research Letters 2013 8:199
We propose the metal-assisted chemical etching of Ge surfaces in water mediated by dissolved oxygen molecules (O2). First, we demonstrate that Ge surfaces around deposited metallic particles (Ag and Pt) are prefe...
Citation: Nanoscale Research Letters 2013 8:151