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The Fifth International Symposium on Atomically Controlled Fabrication Technology

Yuji Kuwahara, Prof Yukio Takahashi

  1. Absolute flatness of three silicon plane mirrors have been measured by a three-intersection method based on the three-flat method using a near-infrared interferometer. The interferometer was constructed using ...

    Authors: Junichi Uchikoshi, Yoshinori Hayashi, Noritaka Ajari, Kentaro Kawai, Kenta Arima and Mizuho Morita

    Citation: Nanoscale Research Letters 2013 8:275

    Content type: Nano Express

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  2. In this work, we focused on the label-free detection of simple protein binding using near-infrared light-responsive plasmonic nanoshell arrays with a controlled interparticle distance. The nanoshell arrays wer...

    Authors: Shuhei Uchida, Nobuyuki Zettsu, Katsuyoshi Endo and Kazuya Yamamura

    Citation: Nanoscale Research Letters 2013 8:274

    Content type: Nano Express

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  3. We have investigated the initial stage of hydrolysis process of Ga-terminated GaN surfaces by using first-principles theoretical calculations. We found that the activation barrier of H2O dissociation at the kinke...

    Authors: Mari Oue, Kouji Inagaki, Kazuto Yamauchi and Yoshitada Morikawa

    Citation: Nanoscale Research Letters 2013 8:232

    Content type: Nano Express

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  4. Ultraprecise aspheric mirrors that offer nanofocusing and high coherence are indispensable for developing third-generation synchrotron radiation and X-ray free-electron laser sources. In industry, the extreme ...

    Authors: Koji Usuki, Takao Kitayama, Hiroki Matsumura, Takuya Kojima, Junichi Uchikoshi, Yasuo Higashi and Katsuyoshi Endo

    Citation: Nanoscale Research Letters 2013 8:231

    Content type: Nano Review

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  5. First-principles calculations were performed to investigate the effect of Pd concentration and oxygen vacancies on the stability of Pd at LaFeO3 surfaces. We found a much stronger tendency of Pd to segregate by t...

    Authors: Zhi-xue Tian, Akifumi Uozumi, Ikutaro Hamada, Susumu Yanagisawa, Hidetoshi Kizaki, Kouji Inagaki and Yoshitada Morikawa

    Citation: Nanoscale Research Letters 2013 8:203

    Content type: Nano Express

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  6. When capacitively coupled plasma (CCP) is used to generate large-area plasma, the standing wave effect becomes significant, which results in the hindering of the uniform plasma process such as in a plasma etch...

    Authors: Mitsutoshi Shuto, Fukumi Tomino, Hiromasa Ohmi, Hiroaki Kakiuchi and Kiyoshi Yasutake

    Citation: Nanoscale Research Letters 2013 8:202

    Content type: Nano Express

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  7. SiOxNy films with a low nitrogen concentration (< 4%) have been prepared on Si substrates at 400°C by atmospheric-pressure plasma oxidation-nitridation process using O2 and N2 as gaseous precursors diluted in He....

    Authors: Zeteng Zhuo, Yuta Sannomiya, Yuki Kanetani, Takahiro Yamada, Hiromasa Ohmi, Hiroaki Kakiuchi and Kiyoshi Yasutake

    Citation: Nanoscale Research Letters 2013 8:201

    Content type: Nano Express

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  8. An essentially exact ground-state calculation algorithm for few-electron systems based on superposition of nonorthogonal Slater determinants (SDs) is described, and its convergence properties to ground states ...

    Authors: Hidekazu Goto, Masashi Kojo, Akira Sasaki and Kikuji Hirose

    Citation: Nanoscale Research Letters 2013 8:200

    Content type: Nano Idea

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  9. We propose the metal-assisted chemical etching of Ge surfaces in water mediated by dissolved oxygen molecules (O2). First, we demonstrate that Ge surfaces around deposited metallic particles (Ag and Pt) are prefe...

    Authors: Tatsuya Kawase, Atsushi Mura, Katsuya Dei, Keisuke Nishitani, Kentaro Kawai, Junichi Uchikoshi, Mizuho Morita and Kenta Arima

    Citation: Nanoscale Research Letters 2013 8:151

    Content type: Nano Express

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