Guest edited by Jae Jong Lee (Korea Institute of Machinery & Materials, Korea), Helmut Schift (Paul Scherrer Institut, Switzerland)
To fabricate nanoscale structures on different kinds of substrates, nanopatterning lithography technologies have been studied during the past decades. Especially, nanoimprint lithography (NIL) is a promising technology for producing two-dimensional or three dimensional structures with sub-10 nm half-pitch features. The advantages of this simple process include low cost, high replication fidelity, and relatively high throughput and productivity. Recently, nanoscale and micro-scale hybrid structures have attracted significant research interest due to their potential for use in biosensors, anti-reflection films, anti-fingerprint films, solar cells, nanofluidic and microfluidic channels, and some functional optical films. The nanopatterning lithography systems using roll-typed stamps have become increasingly appealing technologies for undertaking mass production and continuous fabrication of those hybrid patterns on large area substrates. Papers in this thematic series introduce and review the recent advances in the field of the nanopatterning lithography, from the fabrication processes and techniques to manufactured functional devices and their novel applications.